Pore array layer structure, precoating method, film forming method and related devices and process technology realization elements

Technical implementation elements:

3. The embodiments of the present technology provide a hole array layer structure, a precoating method, a film forming method and a related device to solve the problem of instability after the film forming process in the prior art.

4. In the first aspect of the embodiments of the present technology, a hole array layer structure is provided, which is used to form a film-forming space with a substrate, and the film-forming space is used to form a film layer. The array in the substrate is arranged with a plurality of hole units, the hole units penetrate the substrate, and the hole unit includes a first hole portion and a second hole portion superimposed along the thickness direction of the substrate, the second hole portion The hole portion is configured to be connected to the substrate, the projection of the first hole portion on a plane perpendicular to the thickness direction of the substrate has a first hole portion outline, and the second hole portion is perpendicular to the substrate. The projection on the plane in the thickness direction has a second hole contour, the first hole contour surrounds the outside of the second hole contour, and the second hole parts of the plurality of hole units are not communicated with each other , so as to prevent the liquid medium in each of the second hole parts from flowing between the plurality of second hole parts, and the first hole parts of the plurality of hole units are not communicated with each other, so as to prevent each The liquid medium in the first hole portion flows among the plurality of first hole portions.

5. Using the above structure, the side wall of the first hole is set to a closed structure, which can make each hole unit relatively independent, and reduce the movement of the medium between each hole unit after film formation, especially when the film in the hole unit is ruptured. When , the polar solvent under the inner membrane of the pore unit diffuses into other pore units along the first pore, further affecting the stability of other pore units.

6. In some optional embodiments of the present technology, the hole array layer structure further includes a first slot extending outward from the sidewall of the first hole portion perpendicular to the thickness direction of the substrate, and the first A plurality of tooth slots are arranged along the circumference of the first hole portion, and have an opening communicating with the first hole portion at the contour of the first hole portion, and in a plane perpendicular to the thickness direction of the substrate In the projection on , the extension lengths from the groove bottom of the first tooth groove to the opening are not equal.

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